Through-substrate via and redistribution layer with metal paste

Abstract

The invention relates to a semiconductor device for use in a stacked configuration of the semiconductor device and a further semiconductor device. The semiconductor device comprises: a substrate (5) comprising at least part of an electronic circuit (7) provided at a first side thereof. The substrate (5) comprises a passivation layer (19) at the first side and a substrate via that extends from the first side to a via depth beyond a depth of the electronic circuit (7) such that it is reconfigurable into a through-substrate via (10) by backside thinning of the substrate (5). The semiconductor device further comprises: a patterned masking layer (15) on the first side of the substrate (5). The patterned masking layer (15) comprises at least a trench (16) extending fully through the patterned masking layer (15). The trench has been filled with a redistribution conductor (20). The substrate via and the redistribution conductor (20) comprise metal paste (MP) and together form one piece. The effect of the features of the semi-conductor device of the invention is that there is no physical interface between those the through-substrate via (10) and the redistribution conductor (20). As a consequence of the invention the parasitic resistance of this electrical connection is reduced, which results in a better electrical performance of the semiconductor device. The invention further relates to a method of manufacturing such semiconductor device. And the invention relates to a semiconductor assembly comprising a stacked configuration of a plurality of such semiconductor devices.

Dependencies are inferred from the claim text.