Actinic radiation reactor
AssigneeSiemens Water Technologies Corp.
InventorBruce Lee Coulter
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Abstract
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.
Claims7
An actinic radiation reactor comprising:
- a vessel;
- and
- a first array of tubes in the vessel comprising a first set of parallel tubes and a second set of parallel tubes, each tube of the second set of parallel tubes having a respective longitudinal axis that is orthogonal to a respective longitudinal axis of each tube of the first set of parallel tubes, each tube comprising at least one ultraviolet lamp.
Dependencies are inferred from the claim text.