Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit

A plasma reactor, comprising:

• a chamber including a side wall and a ceiling, said side wall being coupled to an RF ground, the chamber sustaining a plasma for material deposition;
• a workpiece support within the chamber having a support surface facing the ceiling and a bias electrode underlying the support surface;
• a source power applicator at said ceiling;
• an RF source power supply of a first frequency coupled to said source power applicator, and an RF bias power supply of a second frequency coupled to said bias electrode;
• a multi-frequency impedance controller providing at least a first adjustable impedance at a first set of frequencies, said multi-frequency impedance controller comprising a variable capacitor enabled to be placed in at least one of two states by a motor, the at least two states of the variable capacitor having different capacitances.