Use of high energy heavy ion beam for direct sputtering
OwnerGary A. Glass, Alexander D. Dymnikov +1inventors
InventorsGary A. Glass, Alexander D. Dymnikov, Bibhudutta Rout
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Abstract
High energy heavy ions are used to produce free space regions by sputtering the high energy beam through a mask onto a substrate. The invention also includes a method of focusing the high energy beam with a beam focusing system. The invention is in part based on an experiment in which 900 keV gold ions were used to sputter aluminum, copper, silicon and silver. The results demonstrate the possibility that high energy heavy ions could be used to fabricate microstructures in selected metals and silicon in a single step process.
Claims4
A method of creating micro structures in a substrate, comprising:
- (a) providing a high energy beam focusing system
- (b) providing a substrate;
- (c) providing a high energy heavy ion beam;
- and
- (d) focusing said beam with said focusing system to sputter selected regions of said substrate and thereby create free space regions.
A method of creating micro structures in a substrate, comprising:
- (a) providing a substrate;
- (b) providing a high energy heavy ion beam;
- (c) providing a mask interposed between said substrate and said beam;
- and
- (d) irradiating said substrate with said beam through said mask;
- (e) wherein said beam sputters regions in said substrate, thereby creating free space regions corresponding to said mask.
Dependencies are inferred from the claim text.