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US 2011/0209663 A1Published application
Multi-Region Processing System and Heads
AssigneeIntermolecular, Inc.
InventorsRick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao
Life of this patent
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Abstract
The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.
Claims20
A moveable process head for site isolated deposition, comprising:
- an inner wall;
- a moveable assembly disposed within the inner wall and above a portion of a surface of a substrate, wherein a site isolated process region is defined between the inner surface of the inner wall, the moveable assembly, and the portion of the surface of the substrate;
- and
- an outer wall spaced apart from and surrounding a lower portion of the inner wall, wherein multiple site isolated process regions can be defined on the substrate by moving the moveable process head in relation to the substrate.
1 more element
A semiconductor processing chamber, comprising:
- a substrate support configured to support a substrate;
- a moveable process head disposed over a portion of a surface of a substrate, wherein the substrate is held on the substrate support, and wherein the moveable process head comprises an inner wall and a moveable assembly disposed within the inner wall, and wherein a site isolated process region is defined between the inner surface of the inner wall, the moveable assembly, and the portion of the surface of the substrate.
Dependencies are inferred from the claim text.