Photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro MASUYAMA, Takashi HIRAOKA
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Abstract
The present invention provides a photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
Claims7
A photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
A salt represented by the formula (I-1):
- wherein R8, R9 and R10 each independently represent C1-C12 hydrocarbon group which can have one or more substituents, and two or three selected from the group consisting of R8, R9 and R10 can be bonded each other to form a ring together with the nitrogen atom to which they are bonded, R11 represents a benzyl group which can have one or more substituents or a phenylethyl group which can have one or more substituents, Q3 and Q4 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X2 represents a single bond or a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—,
- Y2 represents a C1-C36 aliphatic hydrocarbon group which can have one or more substituents, a C3-C36 saturated cyclic hydrocarbon group which can have one or more substituents, or a C6-C36 aromatic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group and the aromatic hydrocarbon group can be replaced by —O— or —CO—.
Dependencies are inferred from the claim text.