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US 2011/0089030 A1Published application
CIG sputtering target and methods of making and using thereof
AssigneeMiasole
InventorsDaniel R. Juliano, Bao Nguyen, A. Piers Newbery, Asit Rairkar, Johannes Vlcek, Abdelouahab Ziani
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Abstract
A sputtering target includes a copper indium gallium sputtering target material on a backing structure. The sputtering target material has a density of at least 100% or more as defined by the rule of mixtures applied to densities of component elements of the sputtering target material. The sputtering target material has an overall uniform composition.
Claims45
A sputtering target, comprising:
- a copper indium gallium sputtering target material on a backing structure,
- wherein:
- the sputtering target material has a density of at least 100% or more as defined by the rule of mixtures applied to densities of component elements of the sputtering target material;
- and
- the sputtering target material has an overall uniform composition.
2 more elements
A method of making a sputtering target, comprising:
- providing a backing structure, and
- forming a copper indium gallium sputtering target material on the backing structure,
- wherein:
- the sputtering target material has a density at least 100% or more as defined by the rule of mixtures applied to the densities of the component elements;
- and
- the sputtering target material has an overall uniform composition.
3 more elements
A method of making a sputtering target, comprising:
- providing a backing structure, and
- forming a copper indium gallium sputtering target material on the backing structure,
- wherein the sputtering target material is formed on the backing structure by a process selected from the group consisting of:
- direct forging,
- welding,
- casting or molding the sputtering target material in a thixotropic state,
- metal injection molding,
- zone melting,
- vacuum casting,
- strip casting,
- backwards flow pressing,
- roll dip casting, and
- uniaxial pressing of a powder to form at least one hollow ring or tube segment of the sputtering target material.
10 more elements
Dependencies are inferred from the claim text.