Control method and processor of exhaust gas flow rate of processing chamber

A processor including a processing chamber, the processor comprising:

• a pressure gauge configured to measure a pressure within the processing chamber;
• a plurality of exhaust pipe lines configured to exhaust the gas within the processing chamber;
• and
• an exhaust control device configured to control the flow rate of the exhaust gas exhausted from the processing chamber,
• wherein the exhaust control device is configured to determine a total opening degree of the whole exhaust pipe lines so that the pressure within the processing chamber measured by the pressure gauge becomes a prescribed pressure value, to set an opening degree of the respective exhaust pipe line by distributing the total opening degrees of the whole exhaust pipe lines to the opening degree of the respective exhaust pipe line, and to control the flow rate of the exhausted gas by adjusting the opening degree of the respective exhaust pipe line based on the set opening degree.