Back to results
US 2011/0086938 A1Published application
Negative radiation-sensitive resin composition
AssigneeJsr Corporation
InventorsKouji Nishikawa, Akari Sako
Life of this patent
Estimating the term…
Abstract
A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically polymerizable compound includes an ethylenically unsaturated double bond. The organic solvent includes an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere.
Claims20
A negative-tone radiation-sensitive resin composition comprising:
- an alkali-soluble resin including a phenolic hydroxyl group;
- a radically polymerizable compound including an ethylenically unsaturated double bond;
- a radiation-sensitive radical initiator;
- and
- an organic solvent including an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere.
2 more elements
Dependencies are inferred from the claim text.