Exposure apparatus, exposure method, and device manufacturing method
AssigneeNikon Corporation
InventorGo ICHINOSE
Life of this patent
Estimating the term…
Loading patent…
AssigneeNikon Corporation
InventorGo ICHINOSE
Estimating the term…
A first driving section and a second driving section apply a drive farce in an X-axis direction, a Y-axis direction, a Z-axis direction, and a θx direction, respectively, with respect to one end and the other end of a fine movement stage whose one end and the other end in the Y-axis direction are each supported, so that the fine movement stage is relatively movable with respect to a coarse movement stage within an XY plane. Accordingly, by the first and the second driving sections making drive forces in directions opposite to each other in a θx direction apply simultaneously to one end and the other end of the fine movement stage (refer to the black arrow in the drawing), the fine movement stage (and the wafer held by the stage) can be deformed to a concave shape or a convex shape within a YZ plane.
An exposure apparatus that exposes an object with an energy beam via an optical system supported by a first support member, the apparatus comprising:
An exposure apparatus that exposes an object with an energy beam via an optical system supported by a first support member, the apparatus comprising:
An exposure method in which an object is exposed with an energy beam via an optical system supported by a first support member, the method comprising;
Dependencies are inferred from the claim text.