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US 2011/0086314 A1Published application
Melts
AssigneeRohm and Haas Electronic Material LLC
InventorsEdgardo ANZURES, Robert K. Barr
Life of this patent
Estimating the term…
Abstract
A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
Claims5
1-10. (canceled)
A method comprising:
- a) depositing a photoresist on a metal containing substrate;
- b) selectively depositing a masking composition on the photoresist by ink jetting to form a composite, the masking composition consists of one or more compounds for attenuating light in at least the UV range, one or more antioxidants and one or more water soluble or water dispersible compounds selected from the group consisting of:
- R18—(OR19)n(OR20)p(OR21)q—R22 (V)
- where R18 is a linear or branched —(C1-C100)— alkyl;
- R22 is hydroxyl;
- R19, R20 and R21 are independently linear or branched —(C1-C10)— aliphatic;
- and n is an integer of 1 to 100, p is an integer of 0 to 100 and q is an integer of 10 to 20;
- and the composition has a pseudoviscosity of 10,000 cp or greater at room temperature;
- c) applying actinic radiation to the composite;
- d) applying a developer to the composite to remove portions of the photoresist which were not covered by the masking composition to form a pattern of channels on the metal containing substrate, or applying a developer to the composite to remove the masking composition and portions of the photoresist covered by the masking composition to form a pattern of channels on the metal containing substrate;
- and
- e) depositing one or more metal layers in the channels of the metal containing substrate.
9 more elements
A method comprising:
- a) depositing a photoresist having a cover sheet on a metal containing substrate;
- b) selectively depositing a masking composition on the cover sheet of the photoresist by ink jetting to form a composite, the masking composition consists of one or more compounds for attenuating light in at least the UV range, one or more antioxidant and one or more water soluble or water dispersible compounds selected from the group consisting of:
- R18—(OR19)n(OR20)p(OR21)q—R22 (V)
- where R18 is a linear or branched —(C1-C100)— alkyl;
- R22 is hydroxyl;
- R19, R20 and R21 are independently linear or branched —(C1-C10)— aliphatic;
- and n is an integer of 1 to 100, p is an integer of 0 to 100 and q is an integer of 10 to 20, the composition has a pseudoviscosity of 10,000 cp or greater at room temperature;
- b) applying actinic radiation to the composite;
- c) peeling the cover sheet with the masking composition from the photoresist;
- and
- d) applying a developer to the photoresist to remove portions of the photoresist which were not covered by the masking composition to form a pattern of channels on the metal containing substrate, or applying a developer to the photoresist to remove portions of the photoresist covered by the masking composition to form a pattern of channels on the metal containing substrate;
- and
- e) depositing one or more metal layers in the channels of the metal containing substrate.
10 more elements
Dependencies are inferred from the claim text.