Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition

A base generator which is represented by the following chemical formula (1) and generates a base by exposure to electromagnetic radiation and heating:

• wherein R1 and R2 are independently hydrogen or a monovalent organic group and may be the same or different;
• R1 and R2 may be bound to form a cyclic structure which may contain a heteroatom;
• at least one of R1 and R2 is a monovalent organic group;
• R3, R4, R5 and R6 are independently hydrogen, halogen, a hydroxyl group, a nitro group, a nitroso group, a mercapto group, a silyl group, a silanol group or a monovalent organic group and may be the same or different;
• two or more of R3, R4, R5 and R6 may be bound to form a cyclic structure which may contain a heteroatom.