Positive resist composition and method for production of microlens

The positive resist composition according to claim 1, wherein the component (B) is a compound of Formula (8):

• where:
• R11 is a hydrogen atom or a group of Formula 7:
• where:
• R13 is a single bond or a —SO3— group;
• R14 is a C1-10alkyl group;
• and
• m8 is an integer of 0 to 3;
• R12 is a C1-10 substituted or unsubstituted alkyl group, a halogen group, or a C1-10alkoxy group;
• m5 is an integer of 0 or 1, where when m5 is 0, m6 is an integer of 1 to 5 and m7 is an integer satisfying 0≦m7≦(5−m6), and when m5 is 1, m6 is an integer of 1 to 7 and m7 is an integer satisfying 0≦m7≦(7−m6);
• R15 is a hydrogen atom or a C1-10alkyl group;
• Q4 is a C1-10alkylene group;
• m10 is an integer of 1 to 5;
• m11 is an integer satisfying 0≦m11≦(5−m10);
• m14 is an integer satisfying 0≦m14≦(5−m12−m13);
• m9 is an integer of 0 to 10;
• m12 is an integer of 0 to 1;
• m13 is an integer of 0 to 5;
• and
• R11 is a group of Formula (7) as claimed in claim 7 in an amount of 10 to 100% by mol, based on the number of moles of all —OR11 groups contained in the compound of Formula (8).