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US 2011/0086309 A1Published application
Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
AssigneeHitachi Chemical Company, Ltd.
InventorsHanako Nankawa, Masahiro Miyasaka, Yukiko Muramatsu
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Abstract
The invention provides a photosensitive resin composition comprising (A) 100 parts by weight of a binder polymer having 10-65 parts by weight of a divalent group obtained from a specific styrene compound and its derivative, 5-55 parts by weight of a divalent group obtained from a specific (meth)acrylic acid ester and its derivative and 15-50 parts by weight of a divalent group obtained from (meth)acrylic acid, (B) a photopolymerizing compound and (C) a photopolymerization initiator.
Claims9
A photosensitive resin composition comprising:
- (A) 100 parts by weight of a binder polymer having 10-65 parts by weight of a divalent group represented by the following formula (I), 5-55 parts by weight of a divalent group represented by the following formula (II) and 15-50 parts by weight of a divalent group represented by the following formula (III),
- (B) a photopolymerizing compound, and
- (C) a photopolymerization initiator.
- [In formula (I), formula (II) and formula (III), R1, R3 and R5 each independently represent hydrogen or a methyl group, R2 represents C1-3 alkyl, C1-3 alkoxy, hydroxyl, amino or a halogen atom, R4 represents an optionally substituted alicyclic hydrocarbon, optionally substituted aromatic hydrocarbon or optionally substituted heterocyclic group, m represents an integer of 0-5, and when m is 2-5, the multiple R2 groups may be the same or different.]
1 more element
Dependencies are inferred from the claim text.