Substrate holding device, lithography apparatus using same, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMasatoshi Endo
Life of this patent
Estimating the term…
Abstract
The substrate holding device of the present invention includes a holding unit that adsorbs and holds the substrate, a measuring section that measures a physical quantity relating to a adsorption force of the holding unit with the substrate mounted on the holding unit; and a control section that carries out a first determination based on a first condition and a measurement result obtained by the measuring section and a second determination based on a second condition that is different from the first condition and a measurement result obtained by the measuring section to select one of at least three preset operations based on the result of first and second determinations to thereby execute processing depending on the selected operation.
Claims11
A substrate holding device for holding a substrate, comprising:
- a holding unit that adsorbs and holds the substrate;
- a measuring section that measures a physical quantity relating to a adsorption force of the holding unit with the substrate mounted on the holding unit;
- and
- a control section that carries out a first determination based on a first condition and a measurement result obtained by the measuring section and a second determination based on a second condition that is different from the first condition and a measurement result obtained by the measuring section to select one of at least three preset operations based on the result of first and second determinations to thereby execute processing depending on the selected operation.
A lithography apparatus for transferring a pattern onto a substrate, comprising:
- a holding unit that adsorbs and holds the substrate;
- a stage device or a transport hand for moving the holding unit;
- a measuring section that measures a physical quantity relating to a adsorption force of the holding unit with the substrate mounted on the holding unit;
- and
- a control section that carries out a first determination based on a first condition and a measurement result obtained by the measuring section and a second determination based on a second condition that is different from the first condition and a measurement result obtained by the measuring section and selects one of at least three preset operations based on the result of first and second determinations to thereby control the stage device or the transport hand depending on the selected operation.
A device manufacturing method comprising the steps of:
- transferring a pattern onto a substrate by the utilization of a lithography apparatus;
- and
- developing the transferred substrate,
- wherein the lithography apparatus comprises:
- a holding unit that adsorbs and holds the substrate;
- a stage device or a transport hand for moving the holding unit;
- a measuring section that measures a physical quantity relating to a adsorption force of the holding unit with the substrate mounted on the holding unit;
- and
- a control section that carries out a first determination based on a first condition and a measurement result obtained by the measuring section and a second determination based on a second condition that is different from the first condition and a measurement result obtained by the measuring section and selects one of at least three preset operations based on the result of first and second determinations to thereby control the stage device or the transport hand depending on the selected operation.
Dependencies are inferred from the claim text.