Mask Program Defect Test
AssigneeInternational Business Machines Corporation
InventorsKaren D. Badger, Emily E. Gallagher, Christopher Magg
Life of this patent
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Abstract
A method and programmed defect test database for designing and building programmed defect test masks. The method uses a defect free mask that is compared to a ‘defective’ database. A variety of defect types and sizes is programmed into the database and used to inspect the defect-free mask. All defects programmed into the database are not affected by performing the method, regardless of size, so the resolution capability of an inspection tool can be determined.
Claims11
A method of inspecting a patterned mask comprising:
- inspecting the patterned mask, the mask produced from a base design and having a plurality of patterns which contain no defects in an inspection apparatus;
- comparing the measured inspection data for the plurality patterns against a modified version of the base data used to generate the patterns.
A method of determining the resolution capability of an inspection apparatus for various patterns on a mask comprising.
Dependencies are inferred from the claim text.