Methods for globally treating silica optics to reduce optical damage
AssigneeLawrence Livermore National Security, LLC
InventorsPhilip Edward Miller, Tayyab Ishaq Suratwala, Jeffrey Devin Bude, Nan Shen, William Augustus Steele, Ted Alfred Laurence, Michael Dennis Feit, Lana Louie Wong
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Abstract
A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.
Claims20
A method for reducing optical damage in an optical component, the method comprising:
- exposing the optical component to an aqueous solution of mineral acids including at least one of nitric acid (HNO3), hydrochloric acid (HCl), perchloric acid (HClO4), sulphuric acid (H2SO4), or phosphoric acid (H3PO4);
- and
- heating the aqueous solution including the optical component to a temperature in the range of about 50° C. to 120° C.
A method for preventing optical damage to a fused silica based optical component, the method comprising:
- placing the fused silica based optical component in a furnace;
- and
- heating the fused silica based optical component to a temperature of between 700° C. and 1050° C. for a period of between 24 hours and 48 hours.
A method for mitigating optical damage in an optical component, the method comprising:
- providing an optical component having a region including optical damage precursors, the damage precursors including laser damage sites, scratches, and chemical impurities;
- placing the optical component in an aqueous solution including species of one of hydrofluoric acid, fluoride ions, or bi-fluoride ions, the aqueous solution having an etch rate;
- removing a surface layer from the region to minimize etch-related optical damage precursor by-products;
- and
- agitating the aqueous solution using an ultrasonic or megasonic method.
A method for treating an optical component comprising:
- exposing the optical component to a first aqueous solution of mineral acids, the first aqueous solution including at least one of nitric acid (HNO3), hydrochloric acid (HCl), perchloric acid (HClO4), sulphuric acid (H2SO4), or phosphoric acid (H3PO4);
- heating the first aqueous solution including the optical component to a temperature in the range of about 50° C. and 120° C.;
- placing the optical component in a second aqueous solution, the second aqueous solution including species of one of hydrofluoric acid, fluoride ions, or bi-fluoride ions, the aqueous solution having an etch rate;
- removing a surface layer from a region including optical damage precursors, using the second aqueous solution, to minimize etch-related optical damage precursor by-products;
- and
- agitating the second aqueous solution using an ultrasonic or megasonic method.
Dependencies are inferred from the claim text.