Liquid crystal display and fabrication method thereof

A method for fabricating a liquid crystal display, comprising:

• providing a substrate on which a thin film transistor (TFT) part, a pixel part, and a gate pad part are formed;
• forming a metallic film for a gate line on the substrate;
• etching the gate line metallic film through a first printing process to form a gate line having a gate electrode and a gate pad at the TFT part and the pad part;
• sequentially forming a gate insulating layer, a semiconductor layer and a metallic film for a data line on the substrate;
• forming a resist pattern covering a portion of the TFT part on the substrate with the data line metallic film formed thereon through a second printing process;
• etching the data line metallic film, the semiconductor layer and the gate insulating layer by using the resist pattern as a mask to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern that are sequentially stacked, the gate insulating layer pattern being formed to be undercut at the sides of the preliminary active pattern;
• sequentially forming a first transparent conductive film and an insulating layer to cover the resist pattern on the substrate with the metallic film pattern formed thereon;
• etching the insulating layer until the metallic film pattern is exposed;
• removing the resist pattern and the first transparent conductive film on the resist pattern to form a common electrode arranged to be parallel to the gate line;
• selectively etching the remaining insulating layer through a third printing process to form an opening exposing a portion of the first transparent conductive film pattern;
• forming a second transparent conductive film on the substrate having the opening;
• and
• selectively etching the second transparent conductive film, the metallic film pattern and the preliminary active pattern to form an active pattern, a source electrode, a drain electrode and a pixel electrode connected with the drain electrode.