Back to results
US 2011/0079580 A1Published application
Lower chamber heaters for improved etch processes
AssigneeTexas Instruments Incorporated
InventorsJohn Christopher Shriner, Kyran Morris, Esequiel Torres
Life of this patent
Estimating the term…
Abstract
A method of improving a plasma etch chamber by installing heaters on outer surfaces. A method of improving STI etch. A method of improving STI etch in a Hitachi M700 series etcher.
Claims19
A plasma etching chamber, comprising:
- heaters coupled to a lower portion of said plasma etching chamber;
- and
- heaters coupled to a wafer tunnel of said plasma etching chamber.
A method for improving the performance of a plasma etch, comprising:
- installing heaters on a lower outside surface of a plasma etching chamber;
- and
- heating said lower outside surface of said plasma etching chamber to a temperature of at least 35 C.
A method for improving an STI etch, comprising:
- installing heaters on an outside surface of an STI etching chamber;
- and
- heating said outside surface of said STI etching chamber to a temperature of at least 35 C.
Dependencies are inferred from the claim text.