Magnet arrangement for a target backing tube and target backing tube comprising the same

A target backing tube for a rotatable target of a sputtering system, wherein

• the target backing tube has a longitudinal axis, wherein the target backing tube contains a magnet arrangement, the magnet arrangement having a longitudinal axis and a circumferential direction around the longitudinal axis, and being adapted for an arrangement in a cylindrical backing tube, wherein the magnet arrangement comprises in a circumferential sequence:
• a first magnet element extending in parallel to the longitudinal axis,
• a second magnet element extending in parallel to the longitudinal axis, and
• a third magnet element extending in parallel to the longitudinal axis, wherein
• each magnet element has a center axis extending in a radial direction, wherein
• the angular distance between the first and the third magnet elements, with respect to their center axis, is less than about 85 degrees, wherein
• the longitudinal axis of the magnet arrangement corresponds to the longitudinal axis of the backing tube.

A cylindrical target assembly comprising

• a target backing tube for a rotatable target of a sputtering system, wherein
• the target backing tube has a longitudinal axis, wherein the target backing tube contains a magnet arrangement, the magnet arrangement having a longitudinal axis and a circumferential direction around the longitudinal axis, and being adapted for an arrangement in a cylindrical backing tube, wherein the magnet arrangement comprises in a circumferential sequence:
• a first magnet element extending in parallel to the longitudinal axis,
• a second magnet element extending in parallel to the longitudinal axis, and
• a third magnet element extending in parallel to the longitudinal axis, wherein
• each magnet element has a center axis extending in a radial direction, wherein
• the angular distance between the first and the third magnet elements, with respect to their center axis, is less than about 85 degrees, wherein
• the longitudinal axis of the magnet arrangement corresponds to the longitudinal axis of the backing tube, and
• at least one target cylinder disposed around the target backing tube.

A sputtering system comprising

• a vacuum chamber and at least one target backing tube for a rotatable target of a sputtering system, wherein
• the target backing tube has a longitudinal axis, wherein the target backing tube contains a magnet arrangement, the magnet arrangement having a longitudinal axis and a circumferential direction around the longitudinal axis, and being adapted for an arrangement in a cylindrical backing tube, wherein the magnet arrangement comprises in a circumferential sequence:
• a first magnet element extending in parallel to the longitudinal axis,
• a second magnet element extending in parallel to the longitudinal axis, and
• a third magnet element extending in parallel to the longitudinal axis, wherein
• each magnet element has a center axis extending in a radial direction, wherein
• the angular distance between the first and the third magnet elements, with respect to their center axis, is less than about 85 degrees, wherein
• the longitudinal axis of the magnet arrangement corresponds to the longitudinal axis of the backing tube, wherein the target backing tube is disposed in the vacuum chamber.