Cascade source and a method for controlling the cascade source
AssigneeOTB Solar B.V.
InventorsMartin D. Bijker, Leonardus P., M. Clijsen, Franciscus C. Dings, Remco L., J., R. Pennings
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Abstract
A cascade source provided with a cathode housing, a number of cascade plates insulated from each other and stacked on top of each other which together bound at least one plasma channel, and an anode plate provided with an outflow opening connecting to the plasma channel, wherein one cathode is provided per plasma channel, which cathode comprises an electrode which is adjustable relative to the cathode housing in the direction of the plasma channel, wherein the clamping provision is preferably of the collet chuck type. Also described is method for controlling the cascade source in use.
Claims36
A cascade source, comprising:
- a cathode housing;
- a stack of a plurality of cascade plates insulated from each other and stacked on top of each other which together bound a plasma channel extending from a first end of the stack to a second, opposite end of the stack;
- an anode plate provided positioned at the first end of the stack, having an outflow opening connecting to the plasma channel;
- a cathode associated with the plasma channel positioned adjacent the second end of the stack, wherein the cathode comprises an electrode;
- and
- the plasma channel being wholly bounded by parts manufactured from a material which is harmless to a substrate to be treated with the cascade source.
A method for controlling a cascade source, the cascade source comprising:
- a cathode housing;
- a stack of a plurality of cascade plates insulated from each other and stacked on top of each other which together bound a plasma channel extending from a first end of the stack to a second, opposite end of the stack;
- an anode plate positioned at the first end of the stack, having an outflow opening connecting to the at least one plasma channel;
- a cathode associated with the plasma channel positioned adjacent the second end of the stack, wherein the cathode includes an electrode;
- the plasma channel being wholly bounded by parts manufactured from a material which is harmless to a substrate to be treated with the cascade source;
- and
- wherein at least a part of the cathode housing is substantially transparent, the method comprising:
- monitoring the electromagnetic radiation of the plasma through the substantially transparent housing part;
- and
- dependent on the monitored radiation, controlling a plasma forming process by varying a gas supply, or a potential difference between the cathode and the anode, or a combination thereof.
Dependencies are inferred from the claim text.