Treatment method of a getter material and encapsulation method of such getter material
AssigneeCommissariat A L'energie Atomique Et Aux Ene Alt
InventorsXavier BAILLIN, Emmanuelle Lagoutte, Guillaume Rodriguez
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Abstract
A treatment method for a getter material, comprising at least one oxidation and/or nitriding step of getter material conducted under dry atmosphere of dioxygen and/or dinitrogen at pressure greater than approximately 10−2 mbar and at a temperature between approximately 50° C. and 120° C. and over a period between approximately 1 minute and 10 minutes, forming a protective layer composed of oxide and/or nitride of getter material.
Claims18
A treatment method for a getter material, comprising at least one oxidation and/or nitriding step of the getter material conducted under dry atmosphere of dioxygen and/or dinitrogen at a pressure greater than approximately 10−2 mbar and at a temperature between approximately 50° C. and 120° C. and over a period between approximately 1 minute and 10 minutes, forming a protective layer composed of oxide and/or nitride of the getter material.
A getter material comprising at least on the surface one protective layer composed of at least one non-native oxide and/or nitride of the getter material and of a thickness between approximately 1 nm and 10 nm.
Dependencies are inferred from the claim text.