Hard film, plastic working die, plastic working method, and target for hard film
AssigneeKabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
InventorKenji YAMAMOTO
Life of this patent
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Abstract
There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (TiaCrbAlcLd) (BxCyNz) in terms of composition, in which the L is at least one of Si and Y, and the a, b, c, d, x, y, and z each denote the atomic ratio, and satisfy: 0.1≦a<0.3; 0.3<b<0.6; 0.2≦c<0.35; 0.01≦d<0.1; a+b+c+d=1; x≦0.1; y≦0.1; 0.8≦z≦1; and x+y+z=1.
Claims13
A hard film, comprising (TiaCrbAlcLd) (BxCyNz) in terms of composition, in which the L is at least one of Si and Y, and the a, b, c, d, x, y, and z each denote the atomic ratio, and satisfy:
- 0.1≦a<0.3;
- 0.3<b<0.6;
- 0.2≦c<0.35;
- 0.01≦d<0.1;
- a+b+c+d=1;
- x≦0.1;
- y≦0.1;
- 0.8≦z<1;
- and
- x+y+z=1.
A hard film, comprising (TiaCrbAlcLdMe) (BxCyNz) in terms of composition, in which the L is at least one of Si and Y, the M is at least one of the group 4 elements (except for Ti), the group 5 elements, the group 6 elements (except for Cr), and rare earth elements, and the a, b, c, d, e, x, y, and z each denote the atomic ratio, and satisfy:
- 0.1≦a<0.3;
- 0.3<b<0.6;
- 0.2≦c<0.35;
- 0.01≦d<0.1;
- 0.01≦e<0.1;
- a+b+c+d+e=1;
- x≦0.1;
- y≦0.1;
- 0.8≦z≦1;
- and
- x+y+z=1.
Dependencies are inferred from the claim text.