Manufacturing method of wiring substrate and design method of wiring substrate
AssigneeFujitsu Limited
InventorMakoto SUWADA
Life of this patent
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Abstract
A method of manufacturing a wiring substrate includes forming a conducting layer on a first insulating layer including a first glass cloth; forming a photosensitive resist layer on the conducting layer; recognizing a first origin position on the first insulating layer; forming a mask on the resist layer by positioning the mask with respect to the first origin position, the mask being formed so as to position wiring patterns only on positions overlapping the first glass cloth in a planar view; and exposing the resist layer via the mask and forming the wiring patterns only on the positions overlapping the first glass cloth in the planar view.
Claims16
A method of manufacturing a wiring substrate comprising:
- forming a conducting layer on a first insulating layer including a first glass cloth;
- forming a photosensitive resist layer on the conducting layer;
- recognizing a first origin position on the first insulating layer;
- forming a mask on the resist layer by positioning the mask with respect to the first origin position, the mask being formed so as to position wiring patterns only on positions overlapping the first glass cloth in a planar view;
- and
- exposing the resist layer via the mask and forming the wiring patterns only on the positions overlapping the first glass cloth in the planar view.
A method of designing a wiring substrate comprising:
- acquiring first information relevant to a first glass cloth included in a first insulating layer adjacent to wiring patterns;
- determining a first origin position on the first insulating layer;
- calculating a first region of the first glass cloth with respect to the first origin position based on the first information acquired in said acquiring the first information;
- and
- determining the first region of the first glass cloth as a wiring pattern layout region in which it is possible to form the wiring patterns.
Dependencies are inferred from the claim text.