Back to results
US 2011/0078894 A1Published application
Method for manufacturing monolithic oscillator with baw resonators
AssigneeSTMicroelectronics S.r.l.
InventorsPierre Bar, Sylvain Joblot, Jean-Francois Carpentier
Life of this patent
Estimating the term…
Abstract
A method of adjustment on manufacturing of a monolithic oscillator including circuit elements and a BAW resonator, this method including the steps of: a) forming the circuit elements and the resonator and electrically connecting them; b) covering the resonator with a frequency adjustment layer; c) measuring the output frequency of the oscillator; d) modifying the thickness of the frequency adjustment layer to modify the output frequency of the oscillator.
Claims19
A method, comprising:
- forming a first oscillator on a substrate, the first oscillator having an output;
- forming a resonator on the substrate, the resonator being electrically coupled to the first oscillator;
- forming a frequency adjustment layer on the resonator;
- measuring an output frequency on the output of the first oscillator;
- adjusting the output frequency of the first oscillator by modifying a thickness of the frequency adjustment layer.
2 more elements
A method, comprising:
- forming an oscillator having a first input, a second input, and an output on a substrate, the oscillator being configured to generate a first frequency value, the forming including:
- forming a bulk acoustic wave resonator on the substrate, the resonator having a first electrode coupled to the first input of the oscillator and a second electrode coupled to the second input of the oscillator;
- forming an adjustment layer on the resonator;
- forming a test pad on the substrate, the test pad being coupled to the output of the oscillator;
- measuring an output frequency of the oscillator through the test pad;
- and
- reducing a thickness of the adjustment layer until the output frequency is the first frequency value.
4 more elements
Dependencies are inferred from the claim text.