Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source
AssigneeExcico Group
InventorMaxime Makarov
Life of this patent
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Abstract
The invention relates to a pumped electron source (1) that comprises an ionisation chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterised in that said pumped electron source (1) comprises a power supply (11) adapted for applying to said electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.
Claims20
Pulsed electron source (1) comprising an ionisation chamber (4), an acceleration chamber (2) provided with an electrode (3) for extracting and accelerating the primary ions and forming a beam of secondary electrons, characterised in that it comprises a power supply (11) which is configured so as to apply to said electrode (3) a positive voltage for driving a primary plasma (17) out of the acceleration chamber (2) and a negative voltage pulse for extracting and accelerating the primary ions and forming a beam of secondary electrons.
Method of controlling a pulsed electron source (1) comprising an ionisation chamber (4), an acceleration chamber (2) provided with an electrode (3) for extracting and accelerating the primary ions and forming a beam of secondary electrons, comprising a step of applying to said electrode (3) a positive voltage supplied by an electrical power supply (11) for driving a primary plasma out of the acceleration chamber and a step of applying to said electrode (3) a negative voltage pulse supplied by the electrical power supply (11) in order to extract and accelerate the primary ions and form a beam of secondary electrons.
Dependencies are inferred from the claim text.