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US 2011/0042626 A1Published application
Method for producing semiconductor microparticles and the microparticles
AssigneeM. Technique Co., Ltd.
InventorMasakazu ENOMURA
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AssigneeM. Technique Co., Ltd.
InventorMasakazu ENOMURA
Estimating the term…
It is an object to provide a method for producing compound semiconductor particles in which monodisperse compound semiconductor particles can be prepared according to the intended object, clogging with products does not occur due to self-dischargeability, a large pressure is not necessary, and productivity is high. In producing compound semiconductor particles by separating and precipitating, in a fluid, semiconductor raw materials, the fluid is formed into a thin film fluid between two processing surfaces arranged so as to be able to approach to and separate from each other, at least one of which rotates relative to the other, and the semiconductor raw materials are separated and precipitated in the thin film fluid. Further, in producing semiconductor microparticles containing semiconductor elements by reacting a compound containing semiconductor elements, in a fluid, with a reducing agent, the fluid is formed into a thin film fluid between two processing surfaces arranged so as to be able to approach to and separate from each other, at least one of which rotates relative to the other, and the compound containing semiconductor elements is reacted with the reducing agent in the thin film fluid.
A method for producing semiconductor microparticles, wherein, in separating a raw material of semiconductor in a fluid thereby producing semiconductor microparticles, the fluid is a thin film fluid formed between two processing surfaces arranged so as to be able to approach to and separate from each other, at least one of which rotates relative to the other, and semiconductor microparticles are separated in the thin film fluid.
A method for producing semiconductor microparticles, wherein, in reacting a semiconductor element-containing compound with a reducing agent in a fluid thereby producing semiconductor microparticles containing the semiconductor element, the fluid is a thin film fluid formed between two processing surfaces arranged so as to be able to approach to and separate from each other, at least one of which rotates relative to the other, and the semiconductor element-containing compound is reacted with the reducing agent in the thin film fluid.
A method for producing compound semiconductor microparticles, wherein:
A method for producing semiconductor microparticles, wherein,
A method for producing semiconductor microparticles, wherein:
A method for producing semiconductor microparticles, wherein
Dependencies are inferred from the claim text.