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US 2011/0033801 A1Published application
Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsAnthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
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Abstract
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
Claims9
A coating composition for use with an overcoated photoresist, the coating composition comprising a resin comprising cyanurate groups and hydrophobic groups.
The method of claim 9 wherein the antireflective composition is crosslinked prior to applying the photoresist composition.
Dependencies are inferred from the claim text.