Detection apparatus, exposure apparatus, and device fabrication method

An exposure apparatus comprising:

• a projection optical system configured to project a pattern of a reticle onto a substrate;
• a stage configured to hold the substrate;
• a detection apparatus configured to detect an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of the substrate;
• and
• a control unit configured to control a position of said stage based on the detection result obtained by said detection apparatus,
• said detection apparatus including
• a light source configured to emit first light with a wavelength which is transmitted through the substrate, and second light with a wavelength which is not transmitted through the substrate,
• a photoelectric conversion device, and
• an optical system configured to form an image of the lower-surface mark on a light-receiving surface of said photoelectric conversion device using the first light which is emitted by said light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of said photoelectric conversion device using the second light which is emitted by said light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.

A device fabrication method comprising steps of:

• exposing a substrate using an exposure apparatus;
• and
• performing a development process for the substrate exposed,
• wherein the exposure apparatus includes:
• a projection optical system configured to project a pattern of a reticle onto the substrate;
• a stage configured to hold the substrate;
• a detection apparatus configured to detect an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of the substrate;
• and
• a control unit configured to control a position of said stage based on the detection result obtained by said detection apparatus,
• said detection apparatus including
• a light source configured to emit first light with a wavelength which is transmitted through the substrate, and second light with a wavelength which is not transmitted through the substrate,
• a photoelectric conversion device, and
• an optical system configured to form an image of the lower-surface mark on a light-receiving surface of said photoelectric conversion device using the first light which is emitted by said light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of said photoelectric conversion device using the second light which is emitted by said light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.