Pitch multiplication using self-assembling materials
AssigneeMicron Technology, Inc.
InventorGurtej Sandhu
Life of this patent
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Abstract
Self-assembling materials, such as block copolymers, are used as mandrels for pitch multiplication. The copolymers are deposited over a substrate and directed to self-assemble into a desired pattern. One of the blocks forming the block copolymers is selectively removed. The remaining blocks are used as mandrels for pitch multiplication. Spacer material is blanket deposited over the blocks. The spacer material is subjected to a spacer etch to form spacers on sidewalls of the mandrels. The mandrels are selectively removed to leave free-standing spacers. The spacers may be used as pitch-multiplied mask features to define a pattern in an underlying substrate.
Claims23
A mask structure, comprising:
- a substrate;
- a plurality of spaced-apart mandrels comprising block copolymer material and overlying the substrate;
- and
- a spacer material disposed on sidewalls of the mandrels, the spacer material defining an open volume between the mandrels.
A mask structure, comprising:
- a plurality of spaced-apart mandrels overlying a substrate, some of the mandrels formed of a first mandrel material, others of the mandrels formed of a second mandrel material different from the first material;
- and
- mask lines defined by spacers disposed at sidewalls of the mandrels.
Dependencies are inferred from the claim text.