Production method of optical element and optical element
OwnerJinichi KASUYAinventor
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Abstract
A production method of an optical element, which is utilized in a pickup apparatus using a light source emitting light having wavelength of 380 nm to 420 nm and has a functional layer such as an anti-reflection film 60 formed on a molded portion 50 comprising a resin having an alicyclic structure, comprising steps of forming a first SiO layer 62 in the molded portion 50 by a vapor deposition process using SiO as an evaporation source and introducing O2 gas under a predetermined pressure, forming a second SiO layer 64 on the first SiO layer by a vapor deposition process using SiO as an evaporation source and introducing O2 gas under a pressure lower than the pressure used in forming the first SiO layer 62, and oxidizing the first SiO layer 62 and the second SiO layer 64.
Claims6
A production method of an optical element, which is utilized in a pickup apparatus using a light source emitting light having a wavelength of 380 nm to 420 nm and has a functional layer formed on a molded portion comprising a resin having an alicyclic structure, comprising steps of
- forming a first SiO layer on the molded portion by a vapor deposition process using SiO as an evaporation source and introducing O2 gas under a predetermined pressure,
- forming a second SiO layer on the first SiO layer by a vapor deposition process using SiO as an evaporation source and introducing O2 gas under a pressure lower than the pressure used in forming the first SiO layer, and
- oxidizing the first SiO layer and the second SiO layer.
Dependencies are inferred from the claim text.