Annealing apparatus

An annealing apparatus comprising:

• a processing space for accommodating therein a target substrate to be processed;
• a heating source provided to face at least one side surface of the target substrate, the heating source including a plurality of light emitting elements that emit lights to the target substrate;
• a light-transmitting member provided to correspond to the heating source, lights emitted from the light emitting elements traveling through the light-transmitting member;
• a cooling member for supporting one side of the light-transmitting member, opposite to the processing space, the cooling member being provided to be directly brought into contact with the heating source and the cooling member being made of aluminum or aluminum alloy;
• a cooling unit for cooling the cooling member by using a cooling medium;
• a gas exhaust unit for exhausting the processing space;
• and
• a processing gas supply unit for supplying a processing gas to the processing space,
• wherein the heating source includes a plurality of light emitting element arrays each having a supporter having one surface on which the light emitting elements are adhered by using a high thermal conductive adhesive substance, the supporter being made of an high thermal conductive insulating material, and a thermal diffusion member adhered to the other surface of the supporter, the thermal diffusion member being made of pyrolytic graphite;
• the light emitting element array and the thermal diffusion member are constituted by unitizing;
• the light emitting element arrays are fixed to the cooling member by using a high thermal conductive adhesive substance;
• and the thermal diffusion member is adhered to the other surface of the supporter such that a thickness direction of the thermal diffusion member is set to be identical to a direction in which a thermal conductivity of the pyrolytic graphite is high.

An annealing apparatus comprising:

• a processing space for accommodating therein a target substrate to be processed;
• a supporting member for supporting the target substrate in the processing space;
• a heating source provided to face at least one side surface of the target substrate on the supporting member, the heating source including a plurality of light emitting elements that emit lights to the target substrate;
• a light-transmitting member provided to correspond to the heating source, lights emitted from the light emitting elements traveling through the light-transmitting member;
• a gas exhaust unit for exhausting the processing space;
• and
• a processing gas supply unit for supplying a processing gas to the processing space,
• wherein the light source includes a supporter on which the light emitting elements are attached toward the target substrate, and a reflection layer is formed on the surface of the supporter where the light emitting elements are attached.