Apparatus for measuring aerial image of euv mask

An apparatus for measuring an aerial image of a pattern corresponding to a semiconductor pattern to be formed by scanning the pattern using a scanner, the apparatus comprising:

• a zoneplate lens arranged on a first side of an extreme ultra-violet (EUV) mask including the pattern, the zoneplate lens adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask;
• and
• a detector arranged on a second side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask.

An apparatus for measuring an aerial image, the apparatus comprising:

• a movable unit adapted to move a reflective extreme ultra-violet (EUV) mask disposed thereon in an x-axis and/or y-axis direction;
• and
• a detector arranged on the movable unit, the detector being adapted to sense energy of EUV light reflected by the portion of the reflective EUV mask.