Terminal structure and manufacturing method thereof, and electronic device and manufacturing method thereof
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsToshiji HAMATANI, Hiroki ADACHI
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsToshiji HAMATANI, Hiroki ADACHI
Estimating the term…
A conductor having a projecting portion is formed which forms a terminal portion. An uncured prepreg including a reinforcing material is closely attached to the conductor and the prepreg is cured to form an insulating film including the reinforcing material. When the prepreg is closely attached, the prepreg is stretched by the projecting portion, so that a region of the prepreg, which is closely attached to the conductor, can be thinner than the other region of the prepreg. Then, by reducing the thickness of the entire insulating film, an opening can be formed in the portion having a smaller thickness. The step of reducing the thickness can be performed by etching. Further, it is preferable not to remove the reinforcing material in this step. The strength of a terminal and an electronic device can be increased by leaving the reinforcing material at the opening.
A terminal structure comprising:
A terminal structure comprising:
An electronic device comprising:
An electronic device comprising:
An electronic device comprising:
An electronic device comprising:
An electronic device comprising:
A method for manufacturing a terminal structure, comprising:
A method for manufacturing an electronic device including a first insulating film and at least one electronic element covered with the first insulating film, comprising:
A method for manufacturing an electronic device, comprising:
A method for manufacturing an electronic device, comprising:
Dependencies are inferred from the claim text.