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AssigneeNireco Corporation
InventorsTakeo YAMADA, Takeshi YAMAMOTO, Takahiro YAMAKURA, Shinji HAYASHI, Shingo KAWAI
Estimating the term…
A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.
A film thickness measuring device comprising a light source, a spectroscopic sensor, a processor, and a memory,
A film thickness measuring method by which a thickness of a film on an object surface is measured by a film thickness measuring device including a spectroscopic sensor, a memory storing theoretical values of reflectivity distribution for each film thickness and theoretical values of a characteristic variable for each film thickness and a processor, the method comprising the steps of:
Dependencies are inferred from the claim text.