Measurement apparatus, exposure apparatus, and device fabrication method

A device fabrication method comprising steps of:

• exposing a substrate using an exposure apparatus;
• and
• performing a development process for the substrate exposed,
• wherein the exposure apparatus includes:
• a projection optical system configured to project a pattern of a reticle onto the substrate;
• a measurement apparatus configured to measure a height of the substrate to obtain a surface shape of the substrate;
• and
• a stage configured to adjust a position of the substrate based on the surface shape of the substrate measured by said measurement apparatus,
• said measurement apparatus includes:
• an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the substrate illuminated by a light from a white light source and reference light from a reference surface illuminated by the light from the white light source;
• and
• an optical system configured to guide measurement light beams, reflected at a plurality of measurement points on the substrate, and reference light beams, reflected at a plurality of reference points on the reference surface, to said plurality of detection units, respectively,
• wherein the reference surface generates differences among optical path differences between the measurement light beams and the reference light beams which enter said plurality of detection units, respectively.