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AssigneeASML Netherlands B.V.
InventorsMartinus Wilhelmus VAN DEN HEUVEL, Johannes Christiaan Leonardus Franken, Josephus Cornelius Johannes Antonius Vugts
Estimating the term…
A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.
-24. (canceled)
A pump configured to pump a liquid or liquid-gas mixture, the pump comprising:
A method for substantially reducing pressure waves or pressure peaks in a liquid or liquid-gas mixture, the method comprising:
A conduit or fitting for a pump outlet or pump inlet, the conduit or fitting comprising a gas injection nozzle configured to introduce a gas in a liquid or liquid-gas mixture, the gas injection nozzle at least partially guided through or along the conduit or fitting, wherein a discharge of the gas injection nozzle ends in or close by the pump outlet or pump inlet at an end of the conduit or fitting, and wherein the gas injection nozzle is ring-shaped or mainly ring-shaped and arranged about the perimeter of the conduit or fitting.
Dependencies are inferred from the claim text.