Apparatus and method of application and development
AssigneeTokyo Electron Limited
InventorsNobuaki MATSUOKA, Shinichi Hayashi, Yasushi Hayashida, Yoshitaka Hara
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AssigneeTokyo Electron Limited
InventorsNobuaki MATSUOKA, Shinichi Hayashi, Yasushi Hayashida, Yoshitaka Hara
Estimating the term…
A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
1-8. (canceled)
An application and development apparatus configured to deliver a substrate input to a carrier block by a carrier to a process block via a transportation unit for use in the carrier block, form a coating film including a resist film on said substrate at the process block, transport said substrate to an exposure apparatus via an interface block, apply a development process at said process block to said substrate subjected to exposure and returned to said process block via said interface block, and deliver said substrate subjected to development to said carrier block, said application and development apparatus comprising:
13-20. (canceled)
Dependencies are inferred from the claim text.