Magnetic tunnel junction device and method of manufacturing the same
AssigneesJapan Science and Technology Agency, National Institute of Advanced Industrial Science and Technology
InventorShinji Yuasa
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AssigneesJapan Science and Technology Agency, National Institute of Advanced Industrial Science and Technology
InventorShinji Yuasa
Estimating the term…
The output voltage of an MRAM is increased by means of an Fe(001)/MgO(001)/Fe(001) MTJ device, which is formed by microfabrication of a sample prepared by the following steps. A single-crystalline MgO (001) substrate 11 is prepared. An epitaxial Fe(001) lower electrode (a first electrode) 17 with the thickness of 50 nm is grown on a MgO(001) seed layer 15 at room temperature, followed by annealing under ultrahigh vacuum (2×10−8 Pa) and at 350° C. A MgO(001) barrier layer 21 with the thickness of 2 nm is epitaxially formed on the Fe(001) lower electrode (the first electrode) at room temperature, using a MgO electron-beam evaporation. A Fe(001) upper electrode (a second electrode) with the thickness of 10 nm is then formed on the MgO(001) barrier layer 21 at room temperature. This is successively followed by the deposition of a Co layer 21 with the thickness of 10 nm on the Fe(001) upper electrode (the second electrode) 23. The Co layer 21 is provided so as to increase the coercive force of the upper electrode 23 in order to realize an antiparallel magnetization alignment.
A method of manufacturing a magnetoresistive device, comprising:
A half product of a magnetoresistive device comprising:
A tunnel barrier layer deposited on an amorphous ferromagnetic material layer,
A tunnel barrier layer comprising a magnesium oxide layer on a ferromagnetic material layer,
A magnetoresistive device having a magnetic tunnel junction structure comprising:
A magnetic multilayer film comprising:
Dependencies are inferred from the claim text.