Superresolution in devices with single wavelength illumination
OwnerStephen C. Baerinventor
Life of this patent
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Abstract
In apparatus for superresolution microscopy or microlithography, wherein a spot in the specimen to be examined or in the microlithographic medium is raised to an excited state by a first pulse of light, and a second pulse of light reduces the excitation in the peripheral parts of the spot to increase the resolution of the instrument, a method whereby the wavelength of the second pulse in the specimen or medium is the same as the wavelength of the first pulse, thereby allowing the cost and complexity of the apparatus to be lowered.
Claims16
An apparatus for irradiating an area of a target material in order to produce a measurable effect, comprising:
- a material that responds differently to a short pulse of a particular wavelength of radiation at of an intensity sufficient to be absorbed by a multiphoton process and to a longer pulse of radiation at the same said particular wavelength but at an intensity too low to be absorbed by a multiphoton process, and wherein said short pulse and said longer pulse interact to define the area of said measurable effect;
- a source of radiation producing pulses able to be absorbed by said material by a multiphoton process;
- a beam splitter to split the radiation emanating from said source into a first beam of radiation and a second beam of radiation;
- a pulse stretcher in the path of said first beam adapted to increase the duration of pulses entering it to where the intensity of said pulses is too low to be absorbed by said material by a multiphoton process;
- and
- a beam combiner to combine first beam, after passing through both said pulse stretcher, with said second beam, to form a combined beam, directed to said material.
A method for irradiating an area of a target material in order to produce a measurable effect, comprising:
- a material that responds differently to a short pulse of a particular wavelength of radiation at of an intensity sufficient to be absorbed by a multiphoton process and to a longer pulse of radiation at the same said particular wavelength but at an intensity too low to be absorbed by a multiphoton process, and wherein said short pulse and said longer pulse interact to define the area of said measurable effect;
- producing pulses able to be absorbed by said material by a multiphoton process;
- splitting the radiation emanating from said source into a first beam of radiation and a second beam of radiation;
- stretching the pulse of radiation in said first beam adapted to increase the duration of pulses entering to a pulse duration where the intensity of said pulses is too low to be absorbed by said material by a multiphoton process;
- an
- combining first beam, after passing through both said pulse stretcher, with said second beam, to form a combined beam, directed to said material.
Dependencies are inferred from the claim text.