Method of burying metal and apparatus of depositing metal in concave portion
AssigneesSuguru Noda, Canon Anelva Corporation
InventorsSuguru NODA, Satoshi Takashima
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Abstract
The present invention provides the technology for burying metal even in a fine concave portion such as trench and via. According to an embodiment of the present invention, a vapor of the metal as the objective material, a gas containing halogen for etching the metal, and a metal halide vapor made up of the metal element and the halogen element are supplied to the substrate, which thus forms a metal halide layer in the concave portion, and thereby deposits the metal under the metal halide layer. The procedure can achieve the above object.
Claims26
A method of burying metal, comprising the steps of:
- preparing a substrate having a concave portion formed thereon;
- and
- supplying a metal vapor including a metal, in a gaseous state, a halogen-containing gas containing at least a halogen for etching the metal and a metal halide vapor including a metal halide in a gaseous state being a compound of element of the metal and element of the halogen, to the substrate, wherein the metal halide is deposited in the concave portion by supplying the metal halide vapor to the substrate to form a metal halide layer therein, and a metal in the metal vapor is precipitated under the metal halide layer by supplying the metal vapor to the formed metal halide layer, thereby depositing the metal between the metal halide layer and the substrate.
An apparatus of depositing metal in a concave portion formed on a substrate, comprising:
- a chamber;
- a supporting member placed in the chamber and capable of supporting the substrate;
- and
- a gas-supplying means for supplying a specific gas to the chamber,
- wherein the apparatus is controlled so that a metal vapor including the metal in a gaseous state, a halogen-containing gas containing at least a halogen for etching the metal, and a metal halide vapor including a metal halide in a gaseous state being a compound of element of the metal and element of the halogen are made to exist in the chamber by the supplied specific gas, the metal halide is deposited in the concave portion by supplying the metal halide vapor to the substrate to form a metal halide layer therein, and a metal in the metal vapor is precipitated under the metal halide layer by supplying the metal vapor to the formed metal halide layer, thereby depositing the metal between the metal halide layer and the substrate.
An apparatus of depositing metal in a concave portion, comprising, in a vacuum chamber containing, a target table for placing a metal target thereon;
- a substrate table positioned so as to face the target table and capable of placing a substrate having a concave portion formed on the surface thereof, thereon;
- a first gas supply opening to supply a rare gas;
- and a second gas supply opening to supply a halogen-containing gas containing at least a halogen for etching a metal included in the metal target,
- wherein the target table has a plasma electrode, the first gas supply opening is positioned at a closer side to the target table relative to the second gas supply opening,
- the plasma electrode is controlled so that the rare gas supplied from the first gas supply opening is excited to generate plasma of the rare gas and the formed rare gas plasma sputters the metal target to generate a metal vapor including a metal in a gaseous state, and
- the apparatus is controlled so that the metal vapor, the halogen-containing gas, and a metal halide vapor including a metal halide in a gaseous state being a compound of element of the metal and element of the halogen are made to exist in the chamber, the metal halide is deposited in the concave portion by supplying the metal halide vapor to the substrate to form a metal halide layer therein, a metal in the metal vapor is precipitated under the metal halide layer by supplying the metal vapor to the formed metal halide layer, thereby depositing the metal between the metal halide layer and the substrate.
Dependencies are inferred from the claim text.