Method of Passivating and Reducing Reflectance of a Photovoltaic Cell
AssigneeEnergy Focus, Inc.
InventorsLaszlo A. Takacs, Roger F. Buelow, II
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Abstract
Disclosed is a method of passivating and reducing reflectance of a silicon photovoltaic cell. The method includes the step of providing a silicon wafer of a solar cell having a major surface. A passivation layer of silicon nitride is applied on at least 98 percent of the major surface through a vacuum deposition process. An index-matching film structure, different from silicon nitride, is applied on top of the passivation layer. The index matching film structure provides the majority of the antireflective property of the combination of the passivation layer and the index matching film structure.
Claims16
A method of passivating and reducing reflectance of a silicon photovoltaic cell, comprising the steps of:
- a) providing a silicon wafer of a solar cell having a major surface;
- b) applying a passivation layer of silicon nitride on at least 98 percent of said major surface through a vacuum deposition process;
- and
- c) applying an index-matching film structure, different from silicon nitride, on top of the passivation layer;
- d) the index matching film structure providing the majority, of the antireflective property of the combination of the passivation layer and the index matching film structure.
Dependencies are inferred from the claim text.