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US 2011/0014567 A1Published application
Salt and photoresist composition containing the same
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Masako Sugihara, Yuko Yamashita
Life of this patent
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Abstract
A salt represented by the formula (I—Pb): wherein Xpb represents a single bond or —O—, Rpb represents a single bond etc., Ypb represents a polymerizable group, Zpb represents an organic group, Xpc represents a single bond or a C1-C4 alkylene group, and Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents etc.
Claims9
A salt represented by the formula (I—Pb):
- wherein Xpb represents a single bond or —O—,
- Rpb represents a single bond, a C1-C10 divalent aliphatic hydrocarbon group, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent aliphatic hydrocarbon group and the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—,
- Ypb represents a polymerizable group,
- Zpb represents an organic group,
- Xpc represents a single bond or a C1-C4 alkylene group, and
- Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents, a C4-C36 alicyclic hydrocarbon group which can have one or more substituents or a C6-C36 aromatic hydrocarbon group which can have one or more substituents, and one or more methylene groups in the divalent aliphatic hydrocarbon group and the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—.
3 more elements
Dependencies are inferred from the claim text.