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US 2011/0014566 A1Published application
Salt and photoresist composition containing the same
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Masako Sugihara, Yuko Yamashita
Life of this patent
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Abstract
A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.
Claims9
A salt represented by the formula (I-Pa):
- wherein Xpa represents a single bond or a C1-C4 alkylene group,
- Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—,
- Ypa represents a polymerizable group, and
- Zpa+ represents an organic cation.
1 more element
Dependencies are inferred from the claim text.