Stimulation electrode
AssigneeW. C. Heraeus GmbH
InventorsHeiko Specht, Frank Krüger, Ulrich Hausch, Andreas Reisinger
Life of this patent
Estimating the term…
Abstract
One aspect relates to a stimulation electrode including an electrically conducting base body. The base body encompasses tantalum and is at least partially covered with a porous tantalum oxide layer, which is anodically applied by means of high voltage pulses. Provision is made according to an embodiment for a metallic protective layer to cover the porous tantalum oxide layer so as to prevent a hydrogen embrittlement.
Claims16
A stimulation electrode comprising an electrically conducting base body, wherein the base body encompasses tantalum and
- the base body is at least partially covered with a porous tantalum oxide layer, which is anodically applied by means of high voltage pulses,
- characterized in that
- a metallic protective layer covers the porous tantalum oxide layer so as to prevent a hydrogen embrittlement.
A stimulation electrode comprising:
- an electrically conducting base body consisting of tantalum;
- a porous tantalum oxide layer configured to be anodically applied to the base body by means of high voltage pulses;
- and
- a metallic protective layer covering the porous tantalum oxide layer so as to prevent a hydrogen embrittlement.
A method for producing a stimulation electrode comprising an electrically conducting base body, which encompasses tantalum,
- on which a porous tantalum oxide layer is at least partially applied by means of high voltage pulses,
- characterized in that
- a metallic protective layer is applied onto the porous tantalum oxide layer so as to prevent a hydrogen embrittlement of the porous tantalum oxide layer.
Dependencies are inferred from the claim text.