Patterning process and resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun HATAKEYAMA, Kazuhiro KATAYAMA, Youichi OHSAWA, Masaki OHASHI
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Abstract
A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising a C3-C8 alcohol and an optional C6-C12 ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern.
Claims13
A process for forming a pattern, comprising the steps of:
- coating a first positive resist composition comprising a copolymer comprising recurring units having lactone as an adhesive group and recurring units having an acid labile group, a photoacid generator, and a base generator onto a substrate to form a first resist film, exposing the first resist film to high-energy radiation, post-exposure baking, and developing the first resist film with a developer to form a first resist pattern,
- heating the first resist pattern at 100 to 180° C. for 3 to 180 seconds for causing the base generator to generate an amine compound for inactivating the first resist pattern to acid,
- coating a second positive resist composition comprising a solvent which contains an alcohol of 3 to 8 carbon atoms and an optional ether of 6 to 12 carbon atoms and which does not dissolve away the first resist pattern onto the first resist pattern-bearing substrate to form a second resist film, exposing the second resist film to high-energy radiation, post-exposure baking, and developing the second resist film with a developer to form a second resist pattern.
A chemically amplified positive resist composition comprising a copolymer comprising recurring units having lactone as an adhesive group and recurring units having an acid labile group, a photoacid generator, a base generator, and an organic solvent,
- said base generator having the general formula (2):
- wherein R6, R7, R8, R12, R13, and R14 are each independently hydrogen, a straight, branched or cyclic C1-C6 alkyl group, or a C6-C14 aryl group which may have a straight, branched or cyclic C1-C6 alkyl or alkoxy group, nitro, halogen, cyano, trifluoromethyl, carbonyl, ester, lactone ring, carbonate, maleimide, amide, sulfoxide, sulfone, or sulfonic acid ester group, at least one of R6 to R% and at least one of R12 to R14 may be an aryl group, or at least two of R6 to R8, and at least two of R12 to R14 may bond together to form an aromatic-containing ring,
- R9 and R11 are each independently hydrogen or a straight, branched or cyclic C1-C12 alkyl group which may contain a double bond, ether, amino, carbonyl, hydroxyl or ester group, or a pair of R9 and R11, R9 and R10, and R11 and R10 may bond together to form a ring with the nitrogen atom or atoms to which they are attached,
- m is 1 or 2, in the case of m=1, R10 is a single bond, a straight, branched or cyclic C1-C20 alkylene or alkyne group, C6-C20 arylene group, C2-C12 alkenylene group, or C2-C12 alkynylene group, which group may contain a double bond, ether, sulfide, amino, carbonyl, hydroxyl or ester group, and in the case of m=2, R10 is the foregoing alkylene, alkyne, arylene, alkenylene or alkynylene group, with one hydrogen atom eliminated.
Dependencies are inferred from the claim text.