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AssigneeApplied Microstructures, Inc.
InventorsBoris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
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An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
A structure comprising a substrate with a multilayered coating deposited over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein a thickness of said oxide-based layer which is in direct contact with said substrate is controlled as a function of the chemical composition of said substrate, whereby an ability of said organic-based layer to bond to said oxide-based layer is improved.
A structure comprising a substrate with a multilayered coating applied over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein said multilayered coating includes alternating layers of oxide-based material and organic-based material.
Dependencies are inferred from the claim text.