Gas barrier laminate film and method of producing gas barrier laminate film
AssigneeFUJIFILM Corporation
InventorsNOBUHIKO TAKANO, TOMOYUKI KIKUCHI
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Abstract
A gas barrier laminate film including an organic compound layer and an oxide inorganic compound layer and having both excellent gas barrier properties and durability. The gas barrier laminate film comprises an organic compound layer, a silicon atom-containing compound layer on the organic compound layer, and an inorganic compound oxide layer on the silicon atom-containing compound layer.
Claims14
A gas barrier laminate film comprising at least one combination of a 0.1 μm to 3 μm thick organic compound layer, a 0.005 μm to 0.3 μm thick silicon atom-containing compound layer formed on the organic compound layer, and an inorganic compound oxide layer formed on the silicon atom-containing compound layer.
A method of producing a gas barrier laminate film, comprising:
- forming a 0.1 μm to 3 μm thick organic compound layer on a substrate,
- forming a 0.005 μm to 0.3 μm thick silicon atom-containing compound layer on the organic compound layer, and
- forming an inorganic compound oxide layer on the silicon atom-containing compound layer.
Dependencies are inferred from the claim text.