Antireflection film, production method of the same, polarizing plate and display

A method for producing an antireflection film comprising the steps of:

• (i) producing a transparent substrate film by casting a dope on a support;
• (ii) forming a hard coat layer having a thickness of 8 to 20 μm on the transparent substrate film;
• (iii) forming a high refractive index layer having a refractive index higher than a refractive index of the substrate film by applying a coating solution containing the following (a) to (c);
• (iv) forming a low refractive index layer having a refractive index lower than the refractive index of the substrate film by applying a coating solution containing the following (d) and (e);
• and
• (v) heat treating the antireflection film, wherein
• (a) metal oxide particles having an average primary particle diameter of 10 to 200 nm;
• (b) metal compound represented by Formula AnMBx-m or chelate compounds thereof added independently of the metal oxide particles,
• wherein M represents a metal atom, A represents a functional group which can be hydrolyzed, or a hydrocarbon group provided with a functional group which can be hydrolyzed, B represents an atomic group which has made a covalent or ionic bond with metal atom M, x represents a valence of metal atom M and n represents an integer of not less than 2 and not more than x;
• (c) an ionizing radiation curable resin;
• (d) an organosilicon compound represented by Formula (1), a hydrolyzed compound of the organosilicon compound, a decomposed compound of the organosilicon compound or a polycondensed compound of the organosilicon compound,
• Si(OR)4 Formula (1)
• wherein R represents an alkyl group;
• and
• (e) hollow silica particles each having an outer shell, and a void or a porous portion in the inside.