Metrology system and method for monitoring and correcting system generated errors
AssigneeKLA-Tencor MIE GmbH
InventorsHans-Artur Boesser, Slawomir Czerkas
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Abstract
A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.
Claims16
A metrology system comprising:
- at least one measurement objective for determining a position of structures on a substrate;
- a measurement table movable in at least one X-coordinate direction and in at least one Y-coordinate direction;
- a support for the substrate with the structures to be measured is provided on the measurement table, wherein the support has the shape of the substrate;
- at least two marks being provided on the support for the substrate in such a way that the marks are detectable with the measurement objective by moving the measurement table, the substrate on the support not screening the marks on the support.
A method for monitoring and/or correcting system generated errors, wherein a metrology system comprises at least one measurement objective for determining a position of structures on a substrate, a measurement table movable at least in X-coordinate direction and at least in Y-coordinate direction, wherein the measurement table exhibits a support for the substrate with the structures to be measured, so that the substrate is illuminatable with an illumination system, the method comprising the following steps:
- providing at least two marks at a distance from each other in a region of the support in such a way that these marks are not screened by the substrate to be measured;
- moving the measurement table with the substrate or without the substrate automatically and/or at regular time intervals and/or started by the operator, in such a way that a position of the marks with respect to the coordinate system of the metrology system is measured;
- and
- obtaining from the position of the at least two marks information on a state of the system and wherein the information is adequately displayed and/or archived, and/or obtaining a correction, wherein the obtained correction is applied to the measured values with respect to the positions of the structures on the substrate.
Dependencies are inferred from the claim text.